Comparative study of advanced boron-based ULE doping

Solid State Technology

Volumn 53, Issue 3, 2010, Pages 12-16

  Qin, Shu ^a   Hu, Y Jeff ^a   McTeer, Allen ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED ANNEALING TECHNIQUE; COMPARATIVE STUDIES; DOPING TECHNIQUES; MOLECULAR IMPLANTS; PLASMA DOPING; ULTRA LOW ENERGY;

BORON;

BORON COMPOUNDS;

EID: 77950580309     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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