Plasma doping on 68nm CMOS device source/drain formations

IWJT-2008 - Extended Abstracts 2008 International Workshop on Junction Technology

Volumn , Issue , 2008, Pages 8-13

  Qin, Shu ^a   McTeer, Allen ^a   Hu, Jeff ^a   Liu, Jennifer ^a   Panda, Durga ^a   Trivedi, Jigish ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

CMOS device performance; Plasma doping; Plasma immersion ion implantation (PIII); Source and drain formations; Throughput

Indexed keywords

COMPUTER NETWORKS;

CMOS DEVICE PERFORMANCE; PLASMA DOPING; PLASMA IMMERSION ION IMPLANTATION (PIII); SOURCE AND DRAIN FORMATIONS; THROUGHPUT;

PLASMAS;

EID: 50849096717     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWJT.2008.4540007     Document Type: Conference Paper

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10. th International Conference on Ion Implantation Technology (IIT2008), Monterey, CA, USA, June 08-13, 2008, accepted.