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Volumn 19, Issue 2, 2009, Pages 579-591

High K dielectrics for future CMOS devices

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIELECTRIC MATERIALS; LOW-K DIELECTRIC; NITRIDES; SILICA; SILICON NITRIDE; THRESHOLD VOLTAGE; WORK FUNCTION;

EID: 76549110303     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3122117     Document Type: Conference Paper
Times cited : (8)

References (37)
  • 7
    • 76549122533 scopus 로고    scopus 로고
    • E P Gusev, D A Buchanan, E A Cartier, A Kumar, D DiMaria, S Guha, A Callegari, P C Jamison, D A Neumayer, M Copel, M A Gribelyuk, H Okorn-Schmidt, K Chan, N Bojarczuk, L A Ragnarrson, P Ronsheim, K Rim, R J Fleming, A Moctua, A Ajmera, Tech Digest IEDM(2001) p20.1.1
    • E P Gusev, D A Buchanan, E A Cartier, A Kumar, D DiMaria, S Guha, A Callegari, P C Jamison, D A Neumayer, M Copel, M A Gribelyuk, H Okorn-Schmidt, K Chan, N Bojarczuk, L A Ragnarrson, P Ronsheim, K Rim, R J Fleming, A Moctua, A Ajmera, Tech Digest IEDM(2001) p20.1.1
  • 13
    • 76549121550 scopus 로고    scopus 로고
    • ibid 51 978 (2004)
    • ibid 51 978 (2004)
  • 14
    • 21644440911 scopus 로고    scopus 로고
    • J K Schaeffer, C Capasso, L Fonseca, S Samavedam, D Gilmer, Y Liang, O Adetutu, C Hobbs, E Lckowski, R Gregory, Z X Jiang, K Moore, B Y Nguyen, D Roan, B E White, P J Tobin, Tech Digest IEDM (2004), p287
    • J K Schaeffer, C Capasso, L Fonseca, S Samavedam, D Gilmer, Y Liang, O Adetutu, C Hobbs, E Lckowski, R Gregory, Z X Jiang, K Moore, B Y Nguyen, D Roan, B E White, P J Tobin, Tech Digest IEDM (2004), p287


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.