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Volumn 106, Issue 12, 2009, Pages

Analysis of degradation mechanisms in lattice-matched InAlN/GaN high-electron-mobility transistors

Author keywords

[No Author keywords available]

Indexed keywords

ALGAN/GAN HEMTS; BARRIER LAYERS; DEGRADATION MECHANISM; DEVICE STABILITY; GAN BUFFER; GATE BIAS; GATE LEAKAGES; GATE-BIAS STRESS; IDEALITY FACTORS; INTRINSIC CHANNEL RESISTANCE; IRREVERSIBLE DAMAGE; LATTICE RELAXATION; LATTICE-MATCHED; NEGATIVE GATE; OFF-STATE STRESS; ORDER OF MAGNITUDE; SCHOTTKY CONTACTS; SOURCE AND DRAINS; STRESS CONDITION; SURFACE STATE; TEMPORAL CHANGE; V-PARAMETER;

EID: 73849123015     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3272058     Document Type: Article
Times cited : (107)

References (24)
  • 2
    • 0036610915 scopus 로고    scopus 로고
    • InAlN/(In)GaN high electron mobility transistors: Some aspects of the quantum well heterostructure proposal
    • DOI 10.1088/0268-1242/17/6/307, PII S0268124202335806
    • J. Kuzmik, Semicond. Sci. Technol. 0268-1242 17, 540 (2002). 10.1088/0268-1242/17/6/307 (Pubitemid 34725578)
    • (2002) Semiconductor Science and Technology , vol.17 , Issue.6 , pp. 540-544
    • Kuzmik, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.