Mapping active dopants in single silicon nanowires using off-axis electron holography

Nano Letters

Volumn 9, Issue 11, 2009, Pages 3837-3843

  Den Hertog, Martien I ^a   Schmid, Heinz ^c   Cooper, David ^b   Rouviere, Jean Luc ^a   Björk, Mikael T ^c   Riel, Heike ^c   Rivallin, Pierrette ^b   Karg, Siegfried ^c   Riess, Walter ^c  

^a MINATEC   (France)

^b CEA LETI   (France)

^c IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DETECTION THRESHOLD; DOPANT CONCENTRATIONS; DOPING CONCENTRATION; ELECTRON CHARGE; EXPERIMENTAL DATA; OFF-AXIS ELECTRON HOLOGRAPHY; OXIDE INTERFACES; SILICON NANOWIRES; SIMULATION DEMONSTRATE; SPATIAL RESOLUTION;

ELECTRIC WIRE; ELECTRON HOLOGRAPHY; ELECTRONS; HOLOGRAPHIC INTERFEROMETRY; NANOWIRES;

DOPING (ADDITIVES);

EID: 72849142167     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl902024h     Document Type: Article

References (32)

1. Voyles, P.; Muller, D.; Grazul, J.; Citrin, P.; Gossmann, H. Nature 2002, 416, 826.
2. Molina, S.; Sanchez, A.; Beltran, A.; Sales, D.; Ben, T.; Chisholm, M.; Varela, M.; Pennycook, S.; Galindo, P.; Papworth, A.; Goodhew, P.; Ripalda, J. Appl. Phys. Lett. 2007, 91, 263105.
3. Zelsacher, R.; Wood, A.; Bacher, E.; Prax, E.; Sorschag, K.; Krumrey, J.; Baumgart, J. Microelectron Reliab. 2007, 47, 1585.
4. Tsong, T.; et al. Rev. Sci. Instrum. 1982, 53, 1442.
5. Hoummada, K.; Mangelinck, D.; Cadel, E.; Perrin-Pellegrino, C.; Blavette, D.; Deconihout, B. Microelectron. Eng. 2007, 84, 2517.
6. Blavette, D.; Cadel, E.; Fraczkiewicz, A.; Menand, A. Science 1999, 286, 2317.
7. Perea, D.; Lensch, J.; May, S.; Wessels, B.; Lauhon, L. Appl. Phys. A: Sci. Process. 2006, 85, 271.
8. Eyben, P.; Janssens, T.; Vandervorst, W. Mater. Sci. Eng., B 2005, 124-125, 45.
9. Biberger, R.; Benstetter, G.; Schweinboeck, T.; Breitschopf, P.; Goebel, H. Microelectron. Reliab. 2008, 48, 1339.
10. Ligowski, M.; Moraru, D.; Anwar, M.; Mizuno, T.; Jablonski, R.; Tabe, M. Appl. Phys. Lett. 2008, 93, 142101.
11. Berthe, M.; Stiufiuc, R.; Grandidier, B.; Deresmes, D.; Delerue, C.; Stiévenard, D. Science 2008, 319, 436.
12. Rau, W.; Schwander, P.; Baumann, F.; Höppner, W.; Ourmazd, A. Eps. Rev. Lett. 1999, 82, 2614.
13. Cooper, D.; Truche, R.; Rivallin, P.; Hartmann, J.; Laugier, F.; Bertin, F.; Chabli, A. Appl. Phys. Lett. 2007, 91, 143501.
14. Twitchett, A.; Dunin-Borkowski, R.; Broom, R.; Midgley, P. J. Phys.: Condens. Matter 2004, 16, S181.
15. Chung, J.; Rabenberg, L. Appl. Phys. Lett. 2006, 88, 013106.
16. Sze, S. Semiconductor Devices Physics and Technology; John Wiley & Sons: New York, 1985.
17. Cooper, D.; Ailliot, C.; Truche, R.; Barnes, J.; Hartmann, J.; Bertin, F. J. Appl. Phys. 2008, 104, 064513.
18. Twitchett-Harrison, A.; Yates, T.; Newcomb, S.; Dunin-Borkowski, R.; Midgley, P. Nano Lett. 2007, 7, 2020.
19. Eades, W.; Swanson, R. J. Appl. Phys. 1985, .58, 4267.
20. Angermann, H. Appl. Surf. Sci. 2008, 254, 8067.
21. Nicollian, E.; Brews, J. MOS (Metal Oxide Semiconductor) Physics and Technology; John Wiley & Sons: New York, 1982.
22. Fazzini, P.; Merli, P.; Pozzi, G.; Ubaldi, F. Phys. Rev. B. 2005, 72, 085312.
23. Wagner, R.; Ellis, W. Trans. Met. Soc. AIME 1965, 233, 1053.
24. Pan, L.; Lew, K.; Redwing, J.; Dickey, E. J. Cryst. Growth 2005, 277, 428.
25. Björk, M.; Schmid, H.; Knoch, J.; Riel, H.; Riess, W. Nat. Nanotechnol. 2009, 4, 103.
26. Hannon, J.; Kodambaka, S.; Ross, F.; Tromp, R. Nature 2006, 440, 69.
27. den Hertog, M.; Rouviere, J.; Dhalluin, F.; Desré, P.; Gentile, P.; Ferret, P.; Oehler, F.; Baron, T. Nano Lett. 2008, 8, 1544.
28. -2 has been simulated and is found to be similar to the measured phase gradient shown in Figure 2E. Simulations also predict the existence of phase variations in the vacuum around the doped regions. Such variations were only rarely observed and if so were of reduced intensity. These results will be published in the Institute of Physics Conference Series in 2009.
29. den Hertog, M.; Rouviere, J.; Dhalluin, F.; Gentile, P.; Ferret, P.; Ternon, C.; Baron, T. Inst. Phys. Conf. Ser. 2007, 1, 217.
30. Popescu, R.; Muller, E.; Wanner, M.; Gerthsen, D.; Schowalter, M.; Rosenauer, A.; Bottcher, A.; Loffler, D.; Weis, P. Phys. Rev. B 2007, 76, 235411.
31. Reddick, W. M.; Amaratunga, A. Appl. Phys. Lett. 1995, 67, 495.
32. Ross, F. M.; Tersoff, J.; Reuter, M. C. Phys. Rev. Lett. 2005, 95, 146104.