Scanning spreading resistance microscopy (SSRM) 2d carrier profiling for ultra-shallow junction characterization in deep-submicron technologies

Materials Science and Engineering: B

Volumn 124-125, Issue SUPPL., 2005, Pages 45-53

  Eyben, P ^a   Janssens, T ^a   Vandervorst, W ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

AFM; Carrier profile; Microscopy; Quantification; Spreading resistance; SSRM; Two dimensional

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CARRIER CONCENTRATION; DOPING (ADDITIVES); MOS DEVICES; NITRIDES; SCANNING; SEMICONDUCTOR JUNCTIONS;

AFM; CARRIER-PROFILE; QUANTIFICATION; SPREADING RESISTANCE; SSRM; TWO-DIMENSIONAL;

ATOMIC FORCE MICROSCOPY;

EID: 27844437066     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2005.08.049     Document Type: Conference Paper

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