Advanced rotatable magnetron module designed for large area glass coaters

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 265-269

  Bruckner J ^a   Teschner, G ^a   Milde, F ^a   Krause, J ^a  

^a Von Ardenne Anlagentechnik GmbH   (Germany)

Author keywords

Closed loop process control; Conductive ZAO; Rotatable magnetron; Sputter deposition

Indexed keywords

COATINGS; GAGES; GLASS; PROCESS CONTROL; SPUTTER DEPOSITION;

CLOSED LOOP PROCESS CONTROL; CONDUCTIVE ZAO; ROTATABLE MAGNETRON;

MAGNETRONS;

EID: 33644976870     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. F. Milde, G. Teschner, C. May; Gas inlet systems for large area magnetron sputtering systems, 44th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, 2001, p. 204.
2. F. Milde, M. Dimer, J. Fiukowski, J. Strümpfel; Sputtering of Conductive ZAO films from Metallic and Ceramic Targets using Planar and Cylindrical Magnetrons, 47th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, 2004, p. 255.