The influence of cross-magnetron effect on the properties of indium tin oxide thin films deposited by pulsed dual magnetron discharges

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Kleinhempel, Ronny ^a   Graffel, Benjamin ^a   Lukas, Jan ^b   Kupfer, Hartmut ^a   Dunger, Thoralf ^a   Welzel, Thomas ^a   Richter, Frank ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Cross magnetron effect; Physical vapour deposition (PVD); Pulsed discharges; Sputtering; Structure; Thin films

Indexed keywords

CROSS-MAGNETRON EFFECT; DEPOSITION EXPERIMENTS; DUAL MAGNETRONS; FILM PROPERTIES; FUNCTIONAL FILMS; HOMOGENEOUS FILMS; INDIUM TIN OXIDE FILMS; INDIUM TIN OXIDE THIN FILMS; INHOMOGENEOUS DISTRIBUTION; PHYSICAL PROCESS; PHYSICAL VAPOUR DEPOSITION (PVD); PLASMA PROPERTIES; PULSED DISCHARGES; SPUTTER RATE; STRUCTURAL FILMS; STRUCTURE; SUBSTRATE TEMPERATURE;

DEPOSITION; ELECTRIC DISCHARGES; ELECTRIC PROPERTIES; INDIUM; INDUSTRIAL APPLICATIONS; MAGNETRONS; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY; PLASMA DEPOSITION; PLASMA DEVICES; PLASMA DIAGNOSTICS; PLASMAS; TEMPERATURE MEASUREMENT; THIN FILMS; TIN;

OXIDE FILMS;

EID: 70349436098     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730902     Document Type: Conference Paper

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