Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 3959-3963

  Welzel, Th ^a   Dunger, Th ^a   Richter, F ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Magnesium ( D ); Magnetron; Oxides; Pulsed; Reactive sputtering

Indexed keywords

CHARGE CARRIERS; DEPOSITION; ELECTRIC DISCHARGES; ELECTRONS; EMISSION SPECTROSCOPY; MAGNETRON SPUTTERING; PROBES;

LANGMUIR DOUBLE PROBE; OPTICAL EMISSION SPECTROSCOPY; PULSED MAGNETRON DEPOSITION DISCHARGE; PULSED MAGNETRON SPUTTERING; REACTIVE SPUTTERING;

MAGNESIUM PRINTING PLATES;

CHARGE CARRIERS; DEPOSITION; ELECTRIC DISCHARGES; ELECTRONS; EMISSION SPECTROSCOPY; MAGNESIUM PRINTING PLATES; MAGNETRON SPUTTERING; PROBES;

EID: 33751243632     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.003     Document Type: Article

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