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Applied Surface Science

Volumn 242, Issue 3-4, 2005, Pages 392-398

In-situ monitoring and analysis of GaSb(100) substrate deoxidation

(7) Moller K a Toben L a Kollonitsch, Z a Giesen, Ch b Heuken, M b Willig, F a Hannappel, T a

a HAHN MEITNER INSTITUT (Germany)

b AIXTRON AG (Germany)

Author keywords

Ga 2 O; Ga 2 O 3; GaSb oxides; RAS; RDS; Surface structure; XPS

Indexed keywords

DESORPTION; ETCHING; MORPHOLOGY; OXIDATION; PHOTOEMISSION; SUBSTRATES; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

GASB OXIDES; OXIDE DESORPTION; PHOTOEMISSION SPECTROSCOPY; REFLECTANCE DIFFERENCE SPECTROSCOPY (RDS);

GALLIUM COMPOUNDS;

EID: 13444251313 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2004.09.006 Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.