Characterization of nanostructured GaSb: Comparison between large-area optical and local direct microscopic techniques

Applied Optics

Volumn 47, Issue 28, 2008, Pages 5130-5139

  Nerbo I S ^a   Kildemo, M ^a   Roy, S Le ^a   Simonsen, I ^a,b   Sondergard E ^b   Holt, L ^a   Walmsley, J C ^a  

^a NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

^b SAINT GOBAIN RECHERCHE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC MEDIA; ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; ELECTRON MICROSCOPY; ELLIPSOMETRY; GALLIUM ALLOYS; ION BEAMS; MATRIX ALGEBRA; OPTICAL DATA PROCESSING; OPTICAL ENGINEERING; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; SPUTTERING; TOPOLOGY;

CHARACTERIZATION TOOLS; EFFECTIVE MEDIUM MODEL; LOW ENERGY ION BEAM SPUTTERING; MICROSCOPIC TECHNIQUES; MUELLER MATRIX ELLIPSOMETRY; NANOSTRUCTURED SURFACE; TOPOGRAPHY MEASUREMENT; TOPOLOGICAL PARAMETERS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 60749098316     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.005130     Document Type: Article

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