Formation of nanodots on oblique ion sputtered InP surfaces

Applied Surface Science

Volumn 256, Issue 2, 2009, Pages 562-566

  Som, T ^a   Chini, T K ^b   Katharia, Y S ^c   Tripathy, S ^d   Kanjilal, D ^c  

^a INSTITUTE OF PHYSICS   (India)

^b SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

^c INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^d INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

61.80.Jh; 68.55.Ln; 81.16.Rf; InP; Ion sputtering; Nanodots

Indexed keywords

III-V SEMICONDUCTORS; INDIUM PHOSPHIDE; ION BEAMS; IONS; NANODOTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM PHOSPHIDE; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

61.80.JH; 68.55.LN; 81.16.RF; EXPERIMENTAL CONDITIONS; FIELD EMISSION GUNS; ION SPUTTERED SURFACES; ION SPUTTERING; ION-BEAM SPUTTERING;

VANADIUM COMPOUNDS;

EID: 70449109173     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.08.052     Document Type: Article

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