Elaboration and characterization of barium silicate thin films

Micron

Volumn 39, Issue 8, 2008, Pages 1145-1148

  Geneves T ^a   Domenichini, B ^a   Imhoff, L ^a   Potin, V ^a   Heintz, O ^a   Peterle P M ^a   Bourgeois, S ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

Author keywords

Barium silicate; In situ analyses; XPS

Indexed keywords

ANNEALING; BARIUM; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; NONMETALS; PHOTOELECTRON SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICA; SILICATES; SILICON COMPOUNDS; SPECTRUM ANALYSIS; THICK FILMS;

AIR-EXPOSURE; BARIUM SILICATE; CROSS-SECTIONAL IMAGING; EX-SITU; IN-SITU; IN-SITU ANALYSES; INTER-DIFFUSION; ROOM TEMPERATURES; SECONDARY ION MASS SPECTROMETRY PROFILES; SILICON OXIDES; TRANSMISSION ELECTRON MICROSCOPY (TEM); ULTRA-HIGH VACUUM; X-RAY PHOTOELECTRON SPECTROSCOPY XPS; XPS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 52049093447     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micron.2008.05.010     Document Type: Article

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