Kinetics of evaporation of barium THD precursors used for organometallic chemical vapor deposition (OMCVD) thin films

Journal of Crystal Growth

Volumn 174, Issue 1-4, 1997, Pages 801-805

  Burtman, V ^a   Schieber, M ^a,b   Yitzchaik, S ^a   Yaroslavsky, Y ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Barium precursor; Kinetics of evaporation; NMR spectroscopy; OMCVD

Indexed keywords

AGING OF MATERIALS; BARIUM COMPOUNDS; CRYSTALLIZATION; EVAPORATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR STRUCTURE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; ORGANOMETALLICS; PYROLYSIS; REACTION KINETICS; SYNTHESIS (CHEMICAL);

BARIUM PRECURSORS; CHELATES;

THIN FILMS;

EID: 0031547280     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00021-3     Document Type: Article

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