Effect of bias applied to hot wires on generation of positive and negative charges during silicon hot-wire chemical vapor deposition

Journal of Physical Chemistry C

Volumn 113, Issue 39, 2009, Pages 17011-17017

  Park, Soon Young ^a   Yang, Seung Min ^a   Kim, Chan Soo ^a   Hwang, Nong Moon ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE VALUES; CRYSTALLINITIES; DC POWER SUPPLIES; DEPOSITED FILMS; GAS MOLECULES; HOT WIRE CHEMICAL VAPOR DEPOSITION; HOT WIRES; INPUT AND OUTPUTS; NEGATIVE BIAS; NEGATIVE CHARGE; POSITIVE BIAS; SILICON FILMS; SURFACE IONIZATION;

CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELDS; ELECTRIC POWER MEASUREMENT; ELECTRIC POWER TRANSMISSION NETWORKS; ELECTRIC POWER UTILIZATION; IONIZATION OF GASES; VAPORS; WIRE;

ELECTRIC GENERATORS;

EID: 70350163956     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp906196b     Document Type: Article

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