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Journal of Applied Physics

Volumn 106, Issue 6, 2009, Pages

Effect of Pt addition on Ni silicide formation at low temperature: Growth, redistribution, and solubility

(3) Hoummada, K a,b Perrin Pellegrino, C a,b Mangelinck, D a,b

a AIX MARSEILLE UNIVERSITÉ (France)

b CNRS (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; GRAIN BOUNDARIES; GRAIN GROWTH; GROWTH KINETICS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NICKEL; NICKEL COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICIDES; SILICON; SOLUBILITY; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; DIFFERENT STAGES; DSC MEASUREMENTS; IN-SITU X-RAY DIFFRACTION; LOW TEMPERATURES; MEASURED VALUES; SI (100) SUBSTRATE; SOLUBILITY LIMITS;

PLATINUM ALLOYS;

EID: 70349807826 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3204948 Document Type: Article

Times cited : (50)

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