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Volumn 57, Issue 5, 2007, Pages 373-376

Snowplow effect and reactive diffusion in the Pt doped Ni-Si system

Author keywords

Atom probe field ion microscopy; Interface migration; Interface segregation; Thin films; Transition metal silicides

Indexed keywords

DIFFUSION; DOPING (ADDITIVES); HEAT TREATMENT; PLATINUM; SILICIDES; SNOW PLOWS; THIN FILMS; ULTRASHORT PULSES;

EID: 34250191784     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2007.05.007     Document Type: Article
Times cited : (56)

References (30)
  • 8
    • 34250168422 scopus 로고    scopus 로고
    • M.K. Miller, A. Cerezo, M.G. Hetherington, G.D.W. Smith, Atom Probe Field Ion Microscopy, Oxford, 2005.
  • 29
    • 34250186876 scopus 로고    scopus 로고
    • G. Ottaviani, J.W. Mayer, in: M.J. Howes, D.V. Morgan (Eds.), Reliability and Degradation Semiconductor Devices and Circuit.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.