Improved precision in strain measurement using nanobeam electron diffraction

Applied Physics Letters

Volumn 95, Issue 12, 2009, Pages

  Bch A ^a   Rouvire J L ^a   Clment L ^b   Hartmann, J M ^c  

^a CEA GRENOBLE   (France)

^b STMICROELECTRONICS   (France)

^c CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERGENCE ANGLE; DISTORTION TENSORS; NANOBEAM ELECTRON DIFFRACTION; PROBE SIZE; SI SUBSTRATES; ZONE AXIS;

ELECTRON BEAMS; ELECTRON DIFFRACTION; GERMANIUM; HOLOGRAPHIC INTERFEROMETRY; NANOWIRES; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRONS;

EID: 70349678693     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3224886     Document Type: Article

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