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Volumn 93, Issue 16, 2008, Pages
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Electron diffraction with ten nanometer beam size for strain analysis of nanodevices
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Author keywords
[No Author keywords available]
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Indexed keywords
DIFFRACTION;
ELECTRON BEAMS;
SILICON;
TRANSMISSION ELECTRON MICROSCOPY;
BEAM SIZES;
CONVERGENCE ANGLES;
CROSS SECTIONS;
NANOBEAM DIFFRACTIONS;
NANODEVICES;
QUANTITATIVE;
SILICON DEVICES;
SPATIAL RESOLUTIONS;
SPOT POSITIONS;
STRAIN ANALYSES;
STRAIN INFORMATIONS;
TRANSMISSION ELECTRON MICROSCOPES;
CONVERGENCE OF NUMERICAL METHODS;
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EID: 54949130565
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3003581 Document Type: Article |
Times cited : (29)
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References (13)
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