FIB mask repair technology for EUV mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Amano, Tsuyoshi ^a   Nishiyama, Yasushi ^a   Shigemura, Hiroyuki ^a   Terasawa, Tsuneo ^a   Suga, Osamu ^a   Shiina, Kensuke ^b   Aramaki, Fumio ^b   Yasaka, Anto ^b   Abe, Tsukasa ^c   Mohri, Hiroshi ^c  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b SII NANOTECHNOLOGY INC   (Japan)

^c DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Chemical vapor deposition; EUV; FIB; Mask; Repair; SFET

Indexed keywords

ABSORBER FILMS; CARBON MATERIAL; CARBON-BASED; CDS; CLEANING PROCESS; DEFECT REPAIR; DEPOSITION FILMS; ETCHING PROCESS; EUV; EUV MASK; FIB; FIB-CVD; FIELD EXPOSURE; FOCUS CHARACTERISTIC; HYDROGEN RADICAL; MASK REPAIR; SFET; SIMULATION RESULT;

CARBON FILMS; CLEANING; DEFECTS; DEPOSITION; EXTREME ULTRAVIOLET LITHOGRAPHY; FOCUSED ION BEAMS; GRAPHITE; HYDROGEN; PHOTOMASKS; REPAIR; TANTALUM; ULTRAVIOLET DEVICES; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 69949133502     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824335     Document Type: Conference Paper

References (20)

1. T. Hashimoto, et al., "Investigation of Defect Repair Methods for EUVL Mask Blanks through Aerial-Image Simulations" Proc. SPIE vol. 5853, 855, (2005).
2. T. Terasawa, et al., "Multilayer bottom topography effect on actinic mask blank inspection signal" Proc. SPIE vol. 6607, 6670K, (2007).
3. T. Shoki, et al., "Recent performance of EUV mask blanks with low thermal expansion glass substrates" Proc. SPIE vol. 6730, 673015, (2007).
4. K. Hayashi, et al., "Development status of EUVL mask blanks in AGC" Proc. SPIE vol. 6730, 67305D, (2007).
5. T. Abe, et al., "EUV mask pattern inspection using current DUV reticle inspection tool" Proc. SPIE vol. 6607, 66070L, (2006)
6. D. Y, Kim, et al., "EUV mask pattern inspection for Memory Mask Fabrication in 45nm node and below" Proc. SPIE vol. 6349, 63492L, (2006).
7. T. Amano, et al., "Evaluation of EUVL-mask pattern defect inspection using 199-nm inspection optics" Proc. SPIE vol. 6730, 67305J, (2007).
8. T. Abe, et al., "Evaluation of dry etching and defect repair of EUVL mask absorber layer" Proc. SPIE vol. 5567, 1435, (2004).
9. T. Abe, et al., "Evaluation of defect repair of EUV mask absorber layer" Proc. SPIE vol. 5853, 866, (2005).
10. T. Amano, et al., "Study of EUVL mask defect repair using FIB-GAE method" Proc. SPIE vol. 7122, 71222H, (2008).
11. Y. Nishiyama, et al., "Ga implantation and interlayer mixing during FIB repair of EUV mask defects" Proc. SPIE vol7122, 71222J, (2008).
12. Z. Zhang, et al., "Investigation of resist effects on EUV mask defect printability" Proc. SPIE vol. 6730, 673016, (2007).
13. T. Liang, et al., "EUV Mask Pattern Defect Printability" Proc. SPIE vol. 6283, 62830K, (2006).
14. H. Aoyama, et al., "Repair specification study for half pitch 32-nm patterns for EUVL" Proc. SPIE vol. 6730, 67305L, (2007).
15. B. Li, et al., "Efficient dry etching of Si with vacuum ultraviolet light and XeF2 in a buffer gas" J. Applied physics 77(1), pp350-356, (1995).
16. Y. Nishiyama, et al., "Damage analysis of EUV mask under Ga focused ion beam irradiation" Proc. SPIE vol. 7028, 70280J, (2008).
17. T. Amano, et al., " Evaluation of defect repair of EUVL mask pattern using FIB-GAE method" Proc. SPIE vol. 7028, 70281T, (2008).
18. Matthew G. Lassiter, et al., "Inhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks" J. Vac. Sci Technol. B 26(3), (2008).
19. Su-Young Lee, et al., "Analysis of process margin in EUV mask repair with nano-machining" Proc. SPIE vol. 7122, 71222I, (2008).
20. H. Oizumi et al., Proc. SPIE Vol. 5751, 1149 (2005).