Analysis of process margin in EUV mask repair with nano-machining

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Lee, Su Young ^a   Kim, Geun Bae ^a   Sim, Hong Seok ^a   Lee, Sang Hyeon ^a   Kim, Hwa Sung ^a   Lee, Jung Hwan ^a   Seo, Hwan Seok ^a   Han, Hak Seung ^a   Kim, Seong Sue ^a   Moon, Seong Yong ^a   Woo, Sang Gyun ^a   Bozak, Ron ^b   Dinsdale, Andrew ^b   Robinson, Tod ^b   Lee, David ^b   Cho, Han Ku ^a  

^a SAMSUNG Electronics   (South Korea)

^b RAVE LLC   (United States)

Author keywords

AIT; EUV; MET; Nano machining; Printability; Repair; Simulation

Indexed keywords

AIT; EUV; MET; NANO-MACHINING; PRINTABILITY; SIMULATION;

ACTINIDES; CONTROLLABILITY; DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY; MACHINING; NANOTECHNOLOGY; PHOTOMASKS; ULTRAVIOLET DEVICES;

REPAIR;

EID: 62649115911     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801415     Document Type: Conference Paper

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