Recent performance of EUV mask blanks with low thermal expansion glass substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Shoki, Tsutomu ^a   Yamada, Takeyuki ^a   Shimojima, Shouji ^a   Shiota, Yuuki ^a   Tsukahara, Mitsuharu ^a   Koike, Kesahiro ^a   Shishido, Hiroaki ^a   Nozawa, Osamu ^a   Sakamoto, Toshiyuki ^a   Hosoya, Morio ^a  

^a HOYA CORPORATION   (Japan)

Author keywords

Defects; EUV lithography; EUV mask blanks; Flatness; Low thermal expansion glass; Multilayer

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; GLASS; LIGHT REFLECTION; MULTILAYERS; PRINTED CIRCUITS; SUBSTRATES; THERMAL EXPANSION;

DEFECT REDUCTION; FLATNESS; LOW THERMAL EXPANSION GLASS; MULTILAYER BLANKS;

MASKS;

EID: 42149191615     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.748369     Document Type: Conference Paper

References (11)

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