Development status of EUVL mask blanks in AGC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Hayashi, Kazuyuki ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

Extreme ultraviolet lithography; Mask blank; Substrate

Indexed keywords

LIGHT REFLECTION; MASKS; MULTILAYER FILMS; SUBSTRATES;

LOW THERMAL EXPANSION MATERIAL (LTEM); MASK BLANK;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 42149098919     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746619     Document Type: Conference Paper

References (5)

1. Takashi Sugiyama, Hiroshi Kojima, Masabumi Ito, Kouji Otsuka, Mika Yokoyama, Masaki Mikami, Kazuyuki Hayashi, Katsuhiro Matsumoto, and Shinya Kikugawa, "Development of EUVL mask blank in AGC", Proc. SPIE, Vol. 6349, 63492J-1-63492J-7, 2006.
2. Akio Koike, Kouji Otsuka, Masabumi Ito, Naoki Sugimoto, Hiroshi Kojima, Hitoshi Mishiro and Katsuhiro Matumoto, "Development of Zero Expansion Silica Glass for EUVL Substrate", 3rd International EUV Lithography symposium, Miyazaki, Japan (2004).
3. SEMI P37-1102 Specification for Extreme Ultraviolet Lithography Mask Substrates, SEMI 2001, 2002.
4. SEMI P38-1103 Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks, SEMI 2003.
5. P. Kearney, R. Randive, A. Ma, D. Krick, A. Weaver, I. Reiss, D. Abraham, P. Mirkarimi, and E. Spiller, "Overcoming substrate defect decoration effects in EUVL mask blank development", Proc. SPIE, Vol. 5567, pp 800-806, 2004.