Highly selective etch process for silicon-on-insulator nano-devices

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 212-217

  Wahlbrink, T ^a   Mollenhauer, T ^a   Georgiev, Y M ^a   Henschel, W ^a   Efavi, J K ^a   Gottlob, H D B ^a   Lemme, M C ^a   Kurz, H ^a   Niehusmann, J ^b   Bolivar, P Haring ^b  

^a AMO GMBH   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

EJ MOSFET; HBr; ICP RIE; Microring resonator; Silicon photonics; SOI

Indexed keywords

ANISOTROPY; CMOS INTEGRATED CIRCUITS; DATA ACQUISITION; MATHEMATICAL MODELS; MOSFET DEVICES; OPTICAL RESOLVING POWER; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; RESONATORS; SEMICONDUCTOR JUNCTIONS; SILICON ON INSULATOR TECHNOLOGY; SURFACE ROUGHNESS;

EJ-MOSFET; HBR; MICRORING RESONATORS; PHOTONIC DEVICES; SILICON PHOTONICS;

SEMICONDUCTING SILICON;

EID: 20144386123     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.029     Document Type: Conference Paper

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