Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist

Electronics Letters

Volumn 44, Issue 2, 2008, Pages 115-116

  Gnan, M ^a,b   Thoms, S ^a   MacIntyre, D S ^a   De La Rue, R M ^a   Sorel, M ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b UNIVERSITY OF FERRARA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG GRATINGS; ELECTRON BEAMS; MICROFABRICATION; PHOTONIC BAND GAP; SILICON ON INSULATOR TECHNOLOGY; WAVELENGTH;

HYDROGEN SILSESQUIOXANE (HSQ); PHOTONIC WIRES; RESISTS; SILICON CORE LAYERS;

ELECTRIC WIRE;

EID: 38649115345     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20082985     Document Type: Article

References (7)

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