Low loss silicon on insulator photonic crystal waveguides made by 193nm optical lithography

Optics Express

Volumn 14, Issue 6, 2006, Pages 2440-2445

  Settle, Michael ^a   Salib, Mike ^b   Michaeli, Albert ^b   Krauss, Thomas F ^a  

^a UNIVERSITY OF ST ANDREWS   (United Kingdom)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLADDING (COATING); CRYSTALS; FABRICATION; FREQUENCIES; PHOTOLITHOGRAPHY; PHOTONS; SILICON;

193NM OPTICAL LITHOGRAPHY; AIR-BRIDGE; DUV LITHOGRAPHY; INSULATOR PHOTONIC CRYSTAL WAVEGUIDES; LATTICE; LOW LOSS SILICON; LOWER SILICON DIOXIDE CLADDING REMAINING; OPTICAL PROXIMITY EFFECT; PROCESS LATITUDE; WIDER RANGE OF PERIODS AND HOLE DIAMETERS;

WAVEGUIDES;

EID: 33645068194     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.002440     Document Type: Article

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