Composition-constitution-morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition

Surface and Coatings Technology

Volumn 204, Issue 1-2, 2009, Pages 215-221

  Snyders, Rony ^a   Jiang, Kaiyun ^a   Music, Denis ^a   Konstantinidis, Stephanos ^a   Markus, Torsten ^b   Reinholdt, Alexander ^a   Mayer, Joachim ^a   Schneider, Jochen M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Ab initio calculations; Bubble formation; Cl incorporation; PECVD alumina

Indexed keywords

AB INITIO CALCULATIONS; ALUMINA COATING; ALUMINA FILMS; CHEMICAL COMPOSITIONS; CHLORINE RELEASE; CL ATOMS; CL INCORPORATION; DESORPTION MEASUREMENTS; ELECTRON DISPERSIVE X-RAY ANALYSIS; PECVD ALUMINA; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRONS; TOTAL ENERGY;

AGGLOMERATION; BUBBLE FORMATION; CALCULATIONS; CHLORINE; DEPOSITION; DESORPTION; DIAMOND FILMS; MORPHOLOGY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ALUMINA;

EID: 68549120688     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.07.019     Document Type: Article

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