Fabrication of carbon nanotube-based nanodevices using a combination technique of focused ion beam and plasma-enhanced chemical vapor deposition

Applied Physics Letters

Volumn 91, Issue 17, 2007, Pages

  Wu, J ^a   Eastman, M ^a   Gutu, T ^a   Wyse, M ^a   Jiao, J ^a   Kim, S M ^b   Mann, M ^b   Zhang, Y ^b   Teo, K B K ^b  

^a PORTLAND STATE UNIVERSITY   (United States)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; FABRICATION; FIELD EMISSION; ION BEAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

FIELD EMITTER ARRAYS; IMBEDDED CATALYST LAYERS; METAL GATED CARBON NANOTUBES; NANODEVICES;

CARBON NANOTUBES;

EID: 35548965538     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2802552     Document Type: Article

References (16)

1. K. Banerjee and N. Srivastava, Proceedings of the 43rd ACM/IEEE on Design Automation Conference, 2006 (unpublished), p. 809.
2. F. Chen and D. Gardner, IEEE Electron Device Lett. 19, 12 (1998).
3. P. Kapur, J. P. McVittie, and K. C. Saraswat, IEEE Trans. Electron Devices 49, 4 (2002).
4. B. Q. Wei, R. Vajtai, and P. M. Ajayan, Appl. Phys. Lett. 79, 1172 (2001).
5. P. G. Collins and P. Avouris, Sci. Am. 283, 62-69 (2000).
6. R. Martel, T. Schmidt, H. R. Shea, T. Hertel, and Ph. Avouris, Appl. Phys. Lett. 73, 2447 (1998).
7. A. V. Melechko, V. I. Merkulov, T. E. McKnight, M. A. Guillorn, K. L. Klein, D. H. Lowndes, and M. L. Simpson, J. Appl. Phys. 97, 041301 (2005).
8. J. F. Wu, L. F. Dong, C. C. Pan, and J. Jiao, Int. J. Nanosci. 5, 579 (2006).
9. G. Pirio, P. Legagneux, D. Pribat, K. B. K. Teo, M. Chhowalla, G. A. J. Amaratunga, and W. I. Milne, Nanotechnology 13, 1 (2001).
10. G. S. Duesberg, A. P. Graham, M. Liebau, R. Seidel, E. Unger, F. Kreupl, and W. Hoenlein, Nano Lett. 3, 257 (2003).
11. M. Nihei, M. Horibe, A. Kawabata, and Y. Awano, Jpn. J. Appl. Phys., Part 1 43, 1856 (2004).
12. R. G. Lacerda, K. B. K. Teo, A. S. Teh, M. H. Yang, S. H. Dalal, D. A. Jefferson, J. H. Durrell, N. L. Rupesinghe, D. Roy, G. A. J. Amaratunga, F. Wyczisk, and P. Legagneux, J. Appl. Phys. 96, 4456 (2004).
13. Y. Homma, D. Takagi, and Y. Kobayashi, Appl. Phys. Lett. 88, 023115 (2006).
14. Y. Choi, J. Spippel-Oakley, and A. Ural, Appl. Phys. Lett. 89, 153130 (2006).
15. S. Talapatra, S. Kar, S. K. Pal, R. Vajtai, L. Ci, P. Victor, M. M. Shaijumon, S. Kaur, O. Nalamasu, and P. M. Ajayan, Nat. Nanotechnol. 1, 112 (2006).
16. Y. Tzeng, Y. Chen, C. Liu, and V. Krishnardula, Proceedings of the Fourth IEEE Conference on Nanotechnology, 2004 (unpublished), p. 495.