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Volumn 18, Issue 48, 2007, Pages
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Low-current focused-ion-beam induced deposition of three-dimensional tungsten nanoscale conductors
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CONTACTS;
FOCUSED ION BEAMS;
NANOELECTRONICS;
SUBSTRATES;
TUNGSTEN COMPOUNDS;
NANOWIRES GROWTH;
SUBSTRATE SURFACES;
TUNGSTEN NANORODS;
TUNGSTEN NANOSCALE CONDUCTORS;
ELECTRIC CONDUCTORS;
GALLIUM;
NANOCRYSTAL;
NANOROD;
NANOWIRE;
TUNGSTEN;
ARTICLE;
CHEMICAL VAPOR DEPOSITION;
CONDUCTOR;
DEVICE;
ELECTRIC RESISTANCE;
ION CURRENT;
MOLECULAR ELECTRONICS;
NANOTECHNOLOGY;
PRIORITY JOURNAL;
SCANNING ELECTRON MICROSCOPY;
VAPOR;
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EID: 35748933530
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/18/48/485305 Document Type: Article |
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Times cited : (25)
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References (13)
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