Low temperature plasma synthesis of silicon nanocrystals: A strategy for high deposition rate and efficient polymorphous and microcrystalline solar cells

Plasma Physics and Controlled Fusion

Volumn 50, Issue 12, 2008, Pages

  Roca I Cabarrocas, P ^a   Djeridane, Y ^a   Nguyen Tran, Th ^a   Johnson, E V ^a   Abramov, A ^a   Zhang, Q ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; COMMON SENSE; DEPOSITION PROCESS; FILM PROPERTIES; FILM QUALITY; HIGH DEPOSITION RATES; LARGE-AREA ELECTRONICS; LOW PRESSURE PLASMA; LOW TEMPERATURE PLASMAS; LOWER COST; MICROCRYSTALLINE SOLAR CELLS; PHOTOVOLTAIC DEVICES; PHOTOVOLTAICS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; SILICON NANOCRYSTALS; SMALL AREA; UPPER LIMITS;

AMORPHOUS FILMS; AMORPHOUS SILICON; DEPOSITION; DEPOSITION RATES; NANOCRYSTALS; PHOTOVOLTAIC CELLS; PHOTOVOLTAIC EFFECTS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SOLAR CELLS;

MICROCRYSTALLINE SILICON;

EID: 67649206745     PISSN: 07413335     EISSN: 13616587     Source Type: Journal    
DOI: 10.1088/0741-3335/50/12/124037     Document Type: Article

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