Device grade hydrogenated polymorphous silicon deposited at high rates

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2092-2095

  Soro, Y M ^a   Abramov, A ^b,c   Gueunier Farret, M E ^a   Johnson, E V ^b   Longeaud, C ^a   Roca i Cabarrocas, P ^b   Kleider, J P ^a  

^a UNIV PARIS SUD   (France)

^b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^c IOFFE INSTITUTE   (Russian Federation)

Author keywords

Chemical vapor deposition; Photovoltaics; Silicon; Solar cells

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HYDROGENATION; PHOTOVOLTAIC CELLS; POLYMORPHISM; SOLAR CELLS;

LOCALIZED STATE DISTRIBUTION; POLYMORPHOUS SILICON;

SILICON;

EID: 43049101098     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.10.047     Document Type: Article

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