Strategy for a loading force induced overlay position shift in step imprint lithography

Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture

Volumn 223, Issue 1, 2009, Pages 9-17

  Shao, J Y ^a   Ding, Y C ^a   Liu, H Z ^a   Wang, L ^a   Yin, L ^a   Shi, Y S ^a   Jiang, W T ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Alignment; Imprint lithography; Overlay; Process optimization

Indexed keywords

ALIGNMENT MEASUREMENT; DEMOULDING; IMPRINT LITHOGRAPHY; INTERACTION FORCES; LOADING FORCE; LOADING PROCESS; MECHANICAL PROCESS; MECHANICAL SYSTEMS; MICROSTRUCTURE FABRICATION; OPTICAL LITHOGRAPHY; OVERLAY; OVERLAY ACCURACY; PATTERN FIDELITY; PATTERN TRANSFERRING; PROCESS DEVELOPMENT; PROCESS OPTIMIZATION; RELATIVE MOVEMENT; RELEASE PROCESS;

ALIGNMENT; LOADING; LOADS (FORCES); OPTICAL VARIABLES MEASUREMENT; OPTIMIZATION; PHOTOLITHOGRAPHY; PROCESS CONTROL;

NANOIMPRINT LITHOGRAPHY;

EID: 67549117111     PISSN: 09544054     EISSN: None     Source Type: Journal    
DOI: 10.1243/09544054JEM1246     Document Type: Article

References (17)

1. Wang, W. J., Mei, X. S., Jiang, G. D., and Yang, C. J. Shape characteristics of microstructures in femtosecond laser multi-pulse ablation of metals. Proc. IMechE, Part B: J. Engineering Manufacture, 2008, 222(B7), 837-848.
2. Xia, Y. and Whitesides, G. M. Soft lithography. Annual Rev. Mater. Sci., 1998, 28, 153-184.
3. Lalev, G., Dimov, S., Kettle, J., Delft, F. van, and Minev, R. Data preparation for focused ion beam machining of complex three-dimensional structures. Proc. IMechE, Part B: J. Engineering Manufacture, 2008, 222(B1), 67-76.
4. Abbott, S. J. and Gaskell, P. H. Mass production of bio-inspired structured surfaces. Proc. IMechE, Part C: J. Mechanical Engineering Science, 2007, 221(C10), 1181-1191.
5. Chou, S. Y., Krauss, P. R., and Renstrom, P. J. Imprint of sub 25 nm vias and trenches in polymers. Appl. Phys. Lett., 1995, 67, 3114-3116.
6. Chou, S. Y., Krauss, P. R., Zhang, W., Guo, L. J., and Zhuang, L. Sub-10nm imprint lithography and applications. J. Vac. Sci. Technol. B, 1997, 15, 2897-2904.
7. Chou, S. Y. and Krauss, P. R. Imprint lithography with sub 10 nm feature size and high throughput. Micro-electron. Engng, 1997, 50, 237-240.
8. Guo, L. J. Recent progress in nanoimprint technology and its applications. J. Phys. D: Appl. Phys., 2004, 37, 123-241.
9. McLelland, G. M., Hart, M. W., Rettner, C. T., Best, M. E., Carter, K. R., and Terris, B. D. Nanoscale patterning of magnetic islands by imprint lithography using a flexible mould. Appl. Phys. Lett., 2002, 81, 1483-1485.
10. Lan, H., Ding, Y., Liu, H., and Lu, B. Development of a step micro-imprint lithography tool. J. Micromech. Microengng, 2007, 17, 2039-2048.
11. Colburn, M., Johnson, S. C., Stewart, M. D., Damle, S., Bailey, T. C., Choi, B., Wedlake, M., Michaelson, T. B., Sreenivasan, S. V., Ekerdt, J. G., and Willson, C. G. Step and flash imprint lithography: a new approach to high-resolution patterning. Proc. SPIE, 1999, 3676, 379-389.
12. Bender, M., Otto, M., Hadam, B., Vratzov, B., Spangenberg, B., and Kurz, H. Fabrication of nano-structures using a UV-based imprint technique. Microelectron. Engng, 2000, 53, 233-236.
13. Choi, J., Nordquist, Cherala, K., Casoose, A. L., Gehoski, K., Dauksher, W. J., Sreenivasan, S. V., and Resnick, D. J. Distortion and overlay performance of UV step and repeat imprint lithography. Microelectron. Engng, 2005, 78-79, 633-640.
14. White, D. L. and Wood II, O. R. Novel alignment system for imprint lithography. J. Vac. Sci. Technol. B, 2000, 18, 3552-3556.
15. Shao, J., Ding, Y., Tang, Y., Liu, H., Lu, B., and Cui, D. A novel overlay process using load release and alignment error pre-compensation method. Microelectron. Engng, 2008, 85, 168-174.
16. Choi, B. J., Meissl, M. J., Colburn, M., Bailey, T. C., Ruchhoeft, P., Sreenivasan, S. V., Prins, F., Banerjee, S. K., Ekerdt, J. G., and Willson, C. G. Layer-to-layer alignment for step and flash imprint lithography. Proc. SPIE, 2001, 4343, 436-442.
17. Li, H., Ding, Y., Tang, Y., Liu, H., and Lu, B. Distortion reduction by load release for imprint lithography. Microelectron. Engng, 2006, 83, 485-491.