Hydrofluoric-acid-resistant and hydrophobic pure-silica-zeolite MEL low-dielectric-constant films

Langmuir

Volumn 25, Issue 9, 2009, Pages 5039-5044

  Yan, Yushan ^a   Lew, Christopher M ^a   Liu, Yan ^a   Day, Brandon ^a,d   Kloster, Grant M ^c   Tiznado, Hugo ^b   Sun, Minwei ^a   Zaera, Francisco ^b   Wang, Junlan ^a  

^a University of California Riverside   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c INTEL CORPORATION   (United States)

^d AIR LIQUIDE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATIVE PROCEDURES; AMBIENT MOISTURE; DIELECTRIC CONSTANTS; ETCH TEST; HEXAMETHYLDISILAZANE; LOW-K FILMS; PURE SILICA ZEOLITES; SEMICONDUCTOR INDUSTRY; SILYLATION; SPIN-ON; TRIMETHYLCHLOROSILANE; WET-ETCH;

ADSORPTION; CALCINATION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILANES; SILICA; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZEOLITES;

DIELECTRIC MATERIALS;

EID: 66549113044     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la803956w     Document Type: Article

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