Room temperature nanoimprint lithography using molds fabricated by molecular beam epitaxy

IEEE Transactions on Nanotechnology

Volumn 7, Issue 3, 2008, Pages 363-370

  Harrer, Stefan ^b   Strobel, Sebastian ^c   Scarpa, Giuseppe ^b   Abstreiter, Gerhard ^c   Tornow, Marc ^d   Lugli, Paolo ^a,b  

^a IEEE

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c WALTER SCHOTTKY INSTITUT   (Germany)

^d TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

GaAs AlGaAs; Molecular beam epitaxy (MBE); Nanofabrication; Nanoimprint lithography; Room temperature nanoimprint lithography (RTNIL)

Indexed keywords

MOLECULAR BEAM EPITAXY; NANOTECHNOLOGY; OPTICAL RESOLVING POWER;

IMPRINT POLYMER; ROOM TEMPERATURE NANOIMPRINT LITHOGRAPHY (RTNIL);

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; RESOLUTION;

EID: 44049094316     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2008.917782     Document Type: Article

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