Microroughness of polymer thin films studied by total-reflection x-ray fluorescence and atomic force microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1958-1963

  Wu, W L ^a   Wallace, W E ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000984931     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590115     Document Type: Article

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