Linewidth fluctuations caused by polymer aggregates in resist films

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 635-640

  Yamaguchi, Toru ^a   Namatsu, Hideo ^a   Nagase, Masao ^a   Yamazaki, Kenji ^a   Kurihara, Kenji ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

Electron beam nanolithography; Linewidth fluctuations; Polymer aggregates

Indexed keywords

EID: 0010253729     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.635     Document Type: Article

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