Enabling process window improvement at 45nm and 32nm with freeform DOE illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Coskun, Tamer H ^a   Sezginer, Apo ^a   Kamat, Vishnu ^a   Kruger, Michiel ^a   Yenikaya, Bayram ^a   Carriere, James ^b   Stack, Jared ^b   Himel, Marc ^b  

^a CADENCE DESIGN SYSTEMS   (United States)

^b Tessera Inc   (United States)

Author keywords

DOE manufacturing; Free form illumination; Process window; Source mask optimization

Indexed keywords

32-NM NODE; CO-OPTIMIZATION; COMMON PROCESS; CONTACT HOLES; DOE MANUFACTURING; FREE-FORM ILLUMINATION; FREEFORM; IMAGE FIDELITY; MANUFACTURING DEFECTS; PROCESS-WINDOW; RANDOM PLACEMENT; SOURCE MASK OPTIMIZATION;

DIFFRACTIVE OPTICAL ELEMENTS; OPTIMIZATION; WINDOWS;

DENSITY (OPTICAL);

EID: 65849274159     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814215     Document Type: Conference Paper

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