Illumination source mapping and optimization with resist based process metrics for low k 1 imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 369-380

  Zhang, Gary ^a   Hansen, Steve ^b  

^a TEXAS INSTRUMENTS   (United States)

^b ASML US Inc   (United States)

Author keywords

ACLV; Aerial image; CD uniformity; Common process window; DOF; Illumination source; Lithography simulation; Mask bias; MEEF; NILS; Off axis illumination; OPC; Process metrics; Pupil fill; Resist modeling; Scattering bars; SRAF

Indexed keywords

AERIAL IMAGES; DOF; ILLUMINATION SOURCES; LITHOGRAPHY SIMULATION; MEEF; NILS; OFF-AXIS ILLUMINATION; PROCESS METRICS; PUPIL FILL; RESIST MODELING;

ABERRATIONS; COMPUTER SIMULATION; DATA ACQUISITION; ERROR ANALYSIS; LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; OPTIMIZATION; SCANNING;

IMAGING SYSTEMS;

EID: 3843113216     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536006     Document Type: Conference Paper

References (11)

1. J. Gortych and A.E. Rosenbluth, "Method and system for optimizing illumination in an optical photolithography projection imaging system," US Patent 5,680,588 (1997).
2. M. Burkhardt et. al., "Illuminator design for the printing of regular contact patterns," Microelectronic Engineering 41, p.91 (1998).
3. T.-S. Gau et. al., "The Customized Illumination Aperture Filter for Low kl Photolithography Process," SPIE Vol.4000 p.271 (2000).
4. A. Wong et, al., "Level-specific lithography optimization for 1-Gb DRAM," IEEE Transactions on Semiconductor Manufacturing 13, no.1, p.76 (2000).
5. A. Rosenbluth et. al., "Optimum Mask and Source Patterns to Print a Given Shape," SPIE Vol.4346, pp.486-502 (2001).
6. B.W. Smith, "Mutually Optimizing Resolution Enhancement Techniques: Illumination, APSM, Assist Feature OPC, and Gray Bars," SPIE Vol.4346, pp.471-485 (2001).
7. H. Kim et.al., "Layer Specific Illumination Optimization by Monte Carlo Method," SPIE Vol.5040, pp.244-255 (2003).
8. D.G. Flagello et. al., "Optimizing and Enhancing Optical Systems to Meet the Low kl Challenge," SPIE v.5040, pp. 139-150 (2003).
9. J.F. Chen et.al., "Practical Method for Full Chip optical Proximity Correction," SPIE Vol.3051, pp.790-803 ( 1997).
10. J.F. Chen et.al., "Optical Proximity Correction for Intermediate-pitch Features using Sub-resolution Scattering Bars," J. Vac. Sci. Technol. B 15, no.6, pp.2426-2433 (1997).
11. J.S. Peterson, "Analytical Description of Anti-Scattering and Scattering Bar Assist Features," SPIE Vol.4000, pp.77-89 (2000).