Effective Multi-cutline QUASAR Illumination Optimization for SRAM and Logic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5042, Issue , 2003, Pages 153-159

  Brist, Travis ^a   Bailey, George ^a  

^a AGERE SYSTEMS   (United States)

Author keywords

Illumination; Model; Multi outline; OPC; QUASAR; Simulation

Indexed keywords

COMPUTER SIMULATION; LIGHTING; LOGIC DEVICES; OPTIMIZATION; STATIC RANDOM ACCESS STORAGE;

OPTICAL PROXIMITY CORRECTION (OPC);

LITHOGRAPHY;

EID: 0242609804     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504321     Document Type: Conference Paper

References (2)

1. J. Word, S. Zhu, J. Sturtevant, "Assist Feature OPC Implementation for the 130 nm Technology Node with KrF and No Forbidden Pitches", Proc. SPIE, 4691, pp. 1139-1147, 2002.
2. J. Finders, J. School, P. Vanoppen, M. Dusa, B. Socha, G. Vandenberghe, K. Ronse, "KrF lithography for 130nm", Proc. SPIE, 4000, pp. 192-205, 2000.