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Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
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Implementation of pattern-specific illumination pupil optimization on Step & Scan systems A. Engelen, R. Socha, E. Hendrickx, W. Scheepers, F. Nowak, M. Van Dam, A. Liebchen, D. Faas, SPIE Volume 5377 (1323-1333) 2004
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85137613929
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Low-kl imaging: How low can we go?
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Low-kl imaging: how low can we go?, Jo Finders, Mark Eurlings, Koen Van Ingen Schenau, Mircea V. Dusa, Peter Jenkins, Spie Volume 4226, (2000)
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Can DUV take us below 100 nm?
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Can DUV take us below 100 nm?, Jo Finders, Louis Jorritsma, Mark Eurlings, Richard Moerman, Henk van Greevenbroek, Jan B. van School, Donis G. Flagello, Robert J. Socha, Thomas Stammler J. Finders et al, Spie Volume 4346, (2001)
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0031354033
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Practical method for full-chip optical proximity correction
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Practical method for full-chip optical proximity correction", J Fung Chen, Thomas L Laidig, Kurt E Wampler, Roger F Caldwell., SPIE Volume 3051, 790-803 (1997).
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Chen, J.F.1
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Optical Solutions for Contact Hole Lithography at the 90nm Node and beyond
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Optical Solutions for Contact Hole Lithography at the 90nm Node and Beyond, Carsten Kohler et al proceedings Semicon Japan 2002
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Proceedings Semicon Japan 2002
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Kohler, C.1
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ArF solutions for low-kl backend imaging
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ArF Solutions for Low-kl Backend Imaging, Vincent Wiaux, Patrick K. Montgomery, Geert Vandenberghe, Philippe Monnoyer, Kurt G. Ronse, Will Conley, Lloyd C. Litt, Kevin Lucas, Jo Finders, Robert Socha, Douglas J. Van Den Broeke, SPIE Volume 5040, 270-282, (2003)
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Wiaux, V.1
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Finders, J.9
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Contact hole reticle optimization by using interference mapping lithography (IML)
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Contact hole reticle optimization by using interference mapping lithography (IML), Robert J. Socha, Douglas J. Van Den Broeke, Stephen D. Hsu, J. Fung Chen, Thomas L. Laidig, Noel Corcoran, Uwe Hollerbach, Kurt E. Wampler, Xuelong Shi, Will Conley, SPIE Volume 5377 222-240 (2004)
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Socha, R.J.1
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Shi, X.9
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4944252707
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Through pitch low-kl contact hole imaging with CPLTM technology
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Through pitch low-kl contact hole imaging with CPLTM technology, V. Wiaux, J. Bekaert, K. Ronse, G. Vandenberghe, J. Fung Chen, S. Hsu, D. Van Den Broeke, and R. Socha, SPIE Volume 5446, 585-594 (2004)
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Wiaux, V.1
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Van Den Broeke, D.7
Socha, R.8
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25144439900
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Assessment of 5-pole illumination for 65nm-node contact holes
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Assessment of 5-pole illumination for 65nm-node contact holes, Francois Weisbuch, Scott Warrick, Will Conley, Jerome Depre, SPIE Volume 5754 1405-1416 (2005)
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Weisbuch, F.1
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