Sequential PPC and process-window-aware mask layout synthesis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6156, Issue , 2006, Pages

  Sezginer, Apo ^a   Zach, Franz X ^a   Yenikaya, Bayram ^a   Carrero, Jesus ^a   Huang, Hsu Ting ^a  

^a Invarium Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EDGE PLACEMENT ERRORS; MODEL-BASED PROCESSES; PROCESS PARAMETERS; PROCESS-WINDOW-AWARE MASK LAYOUT SYNTHESIS;

COST ACCOUNTING; ERROR COMPENSATION; ETCHING; LITHOGRAPHY; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; OPTIMIZATION; PARAMETER ESTIMATION; TWO DIMENSIONAL;

PROCESS ENGINEERING;

EID: 33745789830     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656667     Document Type: Conference Paper

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