Tailoring carbon nanotips in the plasma-assisted chemical vapor deposition: Effect of the process parameters

Journal of Applied Physics

Volumn 105, Issue 8, 2009, Pages

  Wang, B B ^a,b   Ostrikov, K ^a  

^a CSIRO   (Australia)

^b CHONGQING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED BIAS; CARBON NANOTIPS; DEPOSITION PROCESS; DIFFERENT PROCESS; FORMATION PROCESS; GAS PRESSURES; HIGH QUALITIES; HOT-FILAMENT CHEMICAL VAPOR DEPOSITIONS; ION FLUXES; MASS FLOW RATIOS; NANOSCALE SYNTHESIS; PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITIONS; PROCESS PARAMETERS; THIN CARBON FILMS;

ASPECT RATIO; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; COMMUNICATION CHANNELS (INFORMATION THEORY); NANOTIPS; PLASMA DIAGNOSTICS; PLASMAS; SCANNING ELECTRON MICROSCOPY; SURFACE DIFFUSION; SYNTHESIS (CHEMICAL); VAPORS;

PLASMA DEPOSITION;

EID: 65449133876     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3112025     Document Type: Article

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