Study on glow discharge effects on catalyst films for growing aligned carbon nanofibers in negative bias-enhanced hot filament chemical vapor deposition system

Thin Solid Films

Volumn 474, Issue 1-2, 2005, Pages 103-108

  Wang, B B ^a   Lee, Soonil ^b   Yan, H ^a   Hou, B H ^a   Choi, Seungho ^b  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b Ajou University   (South Korea)

Author keywords

Carbon; Chemical vapor deposition; Glow discharge; Ion bombardment

Indexed keywords

CARBON FIBERS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GLOW DISCHARGES; ION BOMBARDMENT; NANOSTRUCTURED MATERIALS; NICKEL ALLOYS; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; SYNTHESIS (CHEMICAL);

ALIGNED CARBON NANOFIBERS (ACNF); CATALYST FILMS; GLOW DISCHARGE EFFECTS; SILICON SUBSTRATES;

THIN FILMS;

EID: 10844243787     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.022     Document Type: Article

References (26)

1. S. Iijima, Nature 354 (1991) 56.
2. O. Gröning, M. Küttel, Ch. Emmengger, J. Vac. Sci. Technol., B 18 (2000) 665.
3. V.M. Popov, V.E. Van Doren, Phys. Rev., B 61 (2000) 3078.
4. N. Hamada, S. Sawada, A. Oshiyama, Phys. Rev. Lett. 68 (1992) 1579.
5. X.S. Li, H.W. Zhu, L.J. Ci, Carbon 39 (2001) 2077.
6. K. Moriguchi, S. Munetoh, M. Abe, M. Yonemura, J. Appl. Phys. 88 (2000) 6369.
7. J. Yu, Q. Zhang, J. Ahn, Diamond Relat. Mater. 10 (2001) 2157.
8. S.H. Tsai, C.W. Chao, C.L. Lee, H.C. Shih, Appl. Phys. Lett. 74 (1999) 3462.
9. C. Bower, D. Zhou, W. Zhu, D.J. Werder, S. Jin, Appl. Phys. Lett. 77 (2000) 2767.
10. Y.C. Choi, Y.M. Shin, Y.H. Lee, B.S. Lee, Appl. Phys. Lett. 76 (2000) 2367.
11. J.H. Han, W.S. Yang, J.B. Yoo, J. Appl. Phys. 88 (2000) 7363.
12. C. Bower, W. Zhu, S. Jin, Appl. Phys. Lett. 77 (2000) 830.
13. V.I. Merkulov, A.V. Melechko, M.A. Guillorn, Appl. Phys. Lett. 79 (2001) 2970.
14. M. Endo, R. Saito, M.S. Dresselhaus, G. Dresselhaus, in: T.W. Ebbesen (Ed.), Carbon Nanotubes, CRC Press, Florida, 1997, p. 37.
15. H. Nagai, S. Takashima, M. Hiramatsu, J. Appl. Phys. 91 (2002) 2615.
16. V.I. Merkulov, D.H. Lowndes, Y.Y. Wei, G. Eres, Appl. Phys. Lett. 76 (2000) 3555.
17. B.B. Wang, W.L. Wang, K.J. Liao, Phys. Rev., B 63 (2001) 85412.
18. P. Buffat, J.P. Borel, Phys. Rev., A 13 (1976) 2287.
19. J.M. How, Interface in Materials, John Wiley and Sons, 1997, p. 493.
20. H. Grönbeck, D. Tománek, S.G. Kim, A. Rosén, Z. Phys., D 40 (1997) 469.
21. W.Z. Li, J.G. Wen, Y. Tu, Z.F. Ren, Appl. Phys., A 73 (2001) 259.
22. M. Jung, K.Y. Eun, Y. Baik, Thin Solid Films 398-399 (2001) 150.
23. R.J. Zhuan, X.C. Jiang, D.S. Yao, Nucl. Fusion Plasma Phys. (in Chinese) 16 (1996) 60.
24. S. Maniv, W.D. Westood, P.J. Scanlon, J. Appl. Phys. 53 (1982) 856.
25. Y.P. Raizer, Glow Discharge Physics, Springer-Verlag, Berlin Heidelber, 1991, p. 183.
26. L. Nilsson, O. Groening, C. Emmenegger, Appl. Phys. Lett. 76 (2000) 2071.