Bias effect on the growth of carbon nanotips using microwave plasma chemical vapor deposition

Applied Physics Letters

Volumn 81, Issue 4, 2002, Pages 721-723

  Tsai, C L ^a   Chen, C F ^a   Wu, L K ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS EFFECTS; CARBON NANOTIPS; CONDUCTION PATHS; ELECTRON TRANSPORT; FIELD-EMISSION CHARACTERISTICS; HIGH-ASPECT RATIO; HOLLOW STRUCTURE; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; PT FILMS; SOLID BODIES; TRANSMISSION ELECTRON MICROSCOPY IMAGES; TURN-ON FIELD;

ASPECT RATIO; CARBON; CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; FIELD EMISSION CATHODES; NANOTIPS; PLASMA DEPOSITION; PLATINUM; TRANSMISSION ELECTRON MICROSCOPY;

CARBON FILMS;

EID: 79955998345     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1494839     Document Type: Article

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