Effects of etchant gas on the formation of carbon nanotip arrays grown by plasma-enhanced hot filament chemical vapor deposition

Thin Solid Films

Volumn 514, Issue 1-2, 2006, Pages 76-80

  Dang, C ^a   Wang, B B ^b  

^a HUAIYIN INSTITUTE OF TECHNOLOGY   (China)

^b BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Carbon; Chemical vapor deposition; Ion bombardment; Sputtering

Indexed keywords

ETCHING; FILM GROWTH; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; RAMAN SPECTROSCOPY; SPUTTERING;

CARBON NANOTIP ARRAYS; GAS RATIOS; MICRO-RAMAN SPECTROMETRY; REACTION GASES;

CARBON NANOTUBES;

EID: 33745881925     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.036     Document Type: Article

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