Dependence of intermediated noble metals on the optical and electrical properties of ITO/metal/ITO multilayers

Optics Communications

Volumn 282, Issue 12, 2009, Pages 2362-2366

  Lee, J Y ^a   Yang, J W ^a   Chae, J H ^a   Park, J H ^a   Choi, J I ^a   Park, H J ^a   Kim, Daeil ^a  

^a University of Ulsan   (South Korea)

Author keywords

Magnetron sputtering; Optical properties; Thin films; X ray diffraction

Indexed keywords

CU FILMS; DIFFRACTION PEAKS; DIRECT-CURRENT MAGNETRON SPUTTERING; ELECTRICAL RESISTIVITIES; FIGURE OF MERITS; ITO FILMS; METAL FILMS; NOBLE METALS; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL TRANSMISSIONS; OPTICAL TRANSMITTANCES; POLYCARBONATE SUBSTRATES; RADIO FREQUENCIES; SINGLE LAYERS; SINGLE-LAYER FILMS; SN-DOPED; SUBSTRATE HEATING; TRANSPARENT CONDUCTING ELECTRODES; XRD PATTERNS;

CONDUCTIVE FILMS; COPPER; DIFFRACTION; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; ELECTRODEPOSITION; FILM PREPARATION; GOLD; MAGNETRONS; METALLIC FILMS; MULTILAYER FILMS; MULTILAYERS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; PRECIOUS METALS; TIN; X RAY DIFFRACTION;

OPTICAL FILMS;

EID: 65349099962     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2008.12.044     Document Type: Article

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