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Volumn 24, Issue 3, 2003, Pages 471-476

Influence of the Cs partial pressure on the optical and electrical properties of ITO films prepared by dc sputter type negative metal ion beam deposition

(1) Kim, Daeil a,b

a SKION Corporation (United States)

b Samsung Advanced Institute of Technology (SAIT) (South Korea)

Author keywords

Atomic force microscopy; Indium tin oxide; Ion beam; Optical properties

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CESIUM; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; INDIUM COMPOUNDS; ION BEAMS; MORPHOLOGY; OPACITY; PARTIAL PRESSURE; POLYCARBONATES; SPUTTER DEPOSITION;

METAL ION BEAMS;

THIN FILMS;

EID: 0142030510 PISSN: 09253467 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-3467(03)00030-2 Document Type: Article

Times cited : (19)

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