Effect of the oxygen flow on the properties of ITO thin films deposited by ion beam assisted deposition (IBAD)

Thin Solid Films

Volumn 516, Issue 16, 2008, Pages 5454-5459

  Meng, Li Jian ^a,b   Gao, Jinsong ^c   Silva, R A ^a   Song, Shigeng ^d  

^a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

^b UNIVERSITY OF MINHO   (Portugal)

^c CHANGCHUN INSTITUTE OF OPTICS   (China)

^d UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

Author keywords

Ion beam assisted deposition; IR reflectance; ITO; optical and electrical properties; Thin Film

Indexed keywords

ELECTRIC CONDUCTIVITY; FILM THICKNESS; HALL EFFECT; ION BEAM ASSISTED DEPOSITION; LIGHT TRANSMISSION; OXYGEN; X RAY DIFFRACTION ANALYSIS;

GLASS SUBSTRATES; INFRARED REFLECTANCE; ITO FLOW; OXYGEN FLOW; OXYGEN IONS;

THIN FILMS;

EID: 43949138563     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.071     Document Type: Article

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