On the processing-structure-property relationship of ITO layers deposited on crystalline and amorphous Si

Thin Solid Films

Volumn 515, Issue 24 SPEC. ISS., 2007, Pages 8539-8543

  Diplas, S ^a   Ulyashin, A ^b   Maknys, K ^a   Gunnaes, A E ^a   Jorgensen S ^a   Wright, D ^b   Watts, J F ^c   Olsen, A ^a   Finstad, T G ^a  

^a UNIVERSITY OF OSLO   (Norway)

^b INSTITUTE FOR ENERGY TECHNOLOGY   (Norway)

^c UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

AFM; ITO; Magnetron sputtering; TEM; XPS

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; MAGNETRON SPUTTERING; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLINE SILICON; FILM MORPHOLOGY; GLASS SUBSTRATES; INDIUM-TIN-OXIDE (ITO);

ANTIREFLECTION COATINGS;

EID: 34548858187     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.091     Document Type: Article

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