Electro-oxidative nanopatterning of silane monolayers on boron-doped diamond electrodes

Nanotechnology

Volumn 20, Issue 7, 2009, Pages

  Pust, Sascha E ^a   Szunerits, Sabine ^b,c   Boukherroub, Rabah ^c   Wittstock, Gunther ^a  

^a UNIVERSITY OF OLDENBURG   (Germany)

^b GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^c INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BORON-DOPED DIAMOND ELECTRODES; CHEMICALLY MODIFIED; CONDUCTIVE PROBES; DOPED DIAMONDS; N-OCTADECYLTRICHLOROSILANE; NANO-METER SCALE; NANO-PATTERNING; OXIDIZED BORONS; PATTERNING PROCESS; RELATIVE HUMIDITIES; SAMPLE BIAS; SCANNING FORCE MICROSCOPIES; SILANE MONOLAYERS; STABLE PATTERNS;

BORON; DIAMONDS; ELECTRODES; ELECTRON ENERGY LEVELS; MOISTURE; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; SILANES;

ATMOSPHERIC HUMIDITY;

BORON; DIAMOND; N OCTADECYLTRICHLOROSILANE; NANOMATERIAL; SILANE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL MODIFICATION; CHEMICAL STRUCTURE; ELECTROCHEMICAL ANALYSIS; ELECTRODE; HUMIDITY; OXIDATION; PRIORITY JOURNAL; SCANNING FORCE MICROSCOPY;

EID: 65249162259     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/7/075302     Document Type: Article

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